High Quality Substrates for Boron Arsenide Semiconductor Devices
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چکیده
منابع مشابه
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For the first time, patterned growth of boron nitride nanotubes (BNNTs) on Si substrates has been achieved by catalytic chemical vapor deposition (CCVD). Following the boron oxide chemical pathway and our growth vapor trapping approach, high quality and quantity BNNTs can be produced. Effective catalysts have been found to facilitate the growth of BNNTs, while some critical parameters of the sy...
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